Phenom ProX Desktop SEM

BY
Thermo Scientific
Thermo Scientific
Description

The sixth-generation of Thermo Scientific Phenom ProX G6 Desktop SEM fills the gap between light microscopy and floor-model SEM analysis, thus expanding the capabilities of research facilities. It offers fast, high-resolution imaging in addition to an integrated energy-dispersive X-ray diffraction (EDS) detector for robust, easy-to-use, rapid elemental analysis.

Key Differences

Fast and easy to use

The Phenom Pro Desktop SEM can be used to relieve the burden of routine analysis for common samples from floor-model SEM instruments. Instrument configuration and the sample loading mechanism ensure quick imaging with minimal time spent tuning between experiments.

Long-lifetime CeB6 source

Facility users of any experience level can quickly begin producing high-quality results with the Phenom Pro Desktop SEM. Its long-lifetime CeB6 source offers high brightness while requiring low maintenance.

Robust and small form factor

It's high stability and small form factor allow the instrument to be used in practically any lab environment; more simply put, it does not require specialized infrastructure or expert oversight.


Process Control
 

Modern industry demands high throughput with superior quality, a balance that is maintained through robust process control. SEM and TEM tools with dedicated automation software provide rapid, multi-scale information for process monitoring and improvement.

Quality Control
 

Quality control and assurance are essential in modern industry. We offer a range of EM and spectroscopy tools for multi-scale and multi-modal analysis of defects, allowing you to make reliable and informed decisions for process control and improvement.

Fundamental Materials Research

Novel materials are investigated at increasingly smaller scales for maximum control of their physical and chemical properties. Electron microscopy provides researchers with key insight into a wide variety of material characteristics at the micro- to nano-scale.

Semiconductor Pathfinding and Development

Advanced electron microscopy, focused ion beam, and associated analytical techniques for identifying viable solutions and design methods for the fabrication of high-performance semiconductor devices.

Yield Ramp and Metrology

We offer advanced analytical capabilities for defect analysis, metrology, and process control, designed to help increase productivity and improve yield across a range of semiconductor applications and devices.

Semiconductor Failure Analysis

Increasingly complex semiconductor device structures result in more places for failure-inducing defects to hide. Our next-generation workflows help you localize and characterize subtle electrical issues that affect yield, performance, and reliability.

Physical and Chemical Characterization

Ongoing consumer demand drives the creation of smaller, faster, and cheaper electronic devices. Their production relies on high-productivity instruments and workflows that image, analyze, and characterize a broad range of semiconductor and display devices.

Technical Specification

Light optical magnification

  • 20–134x

Electron optical magnification range

  • 160-350,000x

Resolution

  • ≤ 6 nm SED and ≤ 8 nm BSD

Digital zoom

  • Max. 12x

Light optical navigation camera

  • Color

Acceleration voltages

  • Default: 5 kV, 10 kV and 15 kV

  • Advanced mode: adjustable range between 4.8 kV and 20.5 kV imaging and analysis mode

Vacuum modes

  • High vacuum mode

  • Charge reduction mode via optional low vacuum sample holder

Detector

  • Backscattered electron detector (standard)

  • Energy-dispersive X-ray detector (standard)

  • Secondary electron detector (optional)

Sample size

  • Up to 25 mm diameter (optional 32 mm)

Sample height

  • Up to 35 mm (optional 100 mm)

Downloads
Phenom ProX Desktop SEM